At present, working as a Senior R&D Engineer, Advanced Patterning at imec, Belgium. I joined imec in 2018 and worked in various roles since then. I received my PhD degree, major in Computer Engineering, from the Center for Advanced Computer Studies (CACS), University of Louisiana at Lafayette, USA.

Primarily I am responsible for developing and optimizing deep learning algorithms and architectures for solving challenging industrial problems in EUV/EBEAM Lithography and SEM Metrology as well as interdisciplinary research collaboration with multiple universities and research teams (across the globe) and mentoring students for their research thesis (MS/PhD) in this domain. I am a member of IEEE and SPIE.